Atomic Layer Process Innovation Network
This work presents the development and implementation of a low-temperature atomic layer deposition (ALD) process for metallic cobalt thin films. The works are based on a set of five different Co precursors with alkyne ligands.
The 8th International Conference “ALD for Industry” will take place in Dresden at March 11th – 12th, 2025 and aims to connect fundamental science with the industrialization and commercialization of atomic layer deposition (ALD) technology. ALD involves depositing thin film materials and has applications beyond microelectronics, including Li-Ion batteries, photovoltaics, and biomedicine. The annual conference … Weiterlesen
Dear ALPIN Community, we cordially invite you to this year’s the Atomic Layer Process Innovation Network (ALPIN) Workshop. It will take place on September 2–3, 2025 in Gießen, Germany. The event is organized by Dr. Philip Klement and Prof. Sangam Chatterjee at the Institute of Experimental Physics I, Justus Liebig University. The workshop will cover … Weiterlesen
The ASD Workshop was initiated in 2016 to provide a scientific communication channel for the community to learn and exchange about selective deposition with a focus on atomic layer deposition (ALD). It has since offered a forum for open discussions between researchers from academia and industry. The workshop comprises 3 tutorial talks, 8 invited talks … Weiterlesen
Welcome to the ALP workshop at FTME 2025, where we dive into cutting-edge Atomic Layer Processing techniques that are enabling modern microelectronics manufacturing. This workshop will take place on Tuesday, February 11, 2025, as part of the ForLab Microelectronics Symposium at TU Ilmenau. Workshop agenda: 09:00 Welcome (Martin Knaut, TU Dresden)09:05 The current status of … Weiterlesen
This year’s cfaed Summer School “Dresden Microelectronics Academy (DMA’24)” will by steered by Prof. Stefan Mannsfeld and supported by the Dresden companies Bosch, Globalfoundries, Infineon, and X-Fab. The one-week event will take place from 9-13 September 2024.
We present a model for surface coverage during ALD to include precursor desorption from the surface, which leads to incomplete conformality. The model combines existing Knudsen diffusion and Langmuir kinetics methods and includes the Bosanquet formula for gas-phase diffusivity and reaction reversibility.
Dear ALP-Community, This year’s ALPIN workshop will take place from 24.09. to 25.09.2024 in Jena, organized by Adriana Szeghalmi (Fraunhofer IOF) and Mario Ziegler (Leibniz IPHT). We are delighted to have the following companies as sponsors for this year’s workshop: Workshop program @ 24.09.2024 Time Presenter – Title 12:00 – 13:00 M. Z. – Arrival, registration, … Weiterlesen
NaMLab invites to the Novel High-k Application Workshop on March 11th and 12th, 2024. New challenges offered by the application of high-k dielectric materials in micro– and nanoelectronics are discussed by more than 100 participants from industry, research institutes and universities. Please find more information at the NaMLab website: https://www.namlab.com/high-k-workshop-2024-save-the-date-march-11-12th/
The 7th International Conference „ALD FOR INDUSTRY“ will again bridge the gap between fundamental science, industrialization and commercialization of this technology. This event is already establied since 2016 and attracts annually more than 100 participants and numerous exhibitors to visit Dresden. The Conference with Tutorial provides the opportunity to learn more about fundamentals of ALD technology, to get informed about recent progress in the field and to get in contact with industrial and academic partners.