ALPIN-Workshop 2023 – Program and Information

Program Monday, 11.09.2023

12:00Arrival, registration, light lunch
13:00Welcome and introduction  TUC/ENAS
13:40Shiyang He (Leibniz-Institut für Festkörper- und Werkstoffforschung Dresden)
Precise Interface Engineering for High Thermoelectric Performance in CuNi Alloys Using Powder ALD
14:05Kallee Niiranen (Beneq)
Sponsor presentation Beneq
14:20Julia Cipo (Fraunhofer ISIT)
LiPON on porous electrodes
14:35Ludwig Marth (SENTECH)
Atomic Layer Technology by SENTECH Instruments
14:50Martin Klapper (TU Chemnitz)
Atomic layer deposition on carbon fibers with titanium phosphate
15:05Coffee break & Poster session
15:40Jean-Pierre Glauber (Ruhr-Universität Bochum)
Recent advancements in rare earth oxide thin films via ALD based on water assisted processes
16:05Hagen Bryja (FHR Anlagenbau)
ALD development activities at FHR
16:20Estelle Jozwiak (Humboldt-Universität zu Berlin)
Nickel-Iron-Oxide As A Highly Active Catalyst Toward OER Using Atomic Layer Deposition
16:35David Anderson (memsstar)
Comparison of Self-Assembled-Monolayer (SAM) Films: Conventional Fluorinated and  Non Fluorinated Alternative SAM Films – differences and applicative performance
16:50Philipp Wellmann (Universität Leipzig)
Blocking Layer Buildup and Disintegration in the Area-Selective Atomic Layer Deposition of Al2O3 on Silicon Oxide with Silane-based Inhibitors – a DFT Study
17:05Coffee break & Poster session
17:30Virtual lab tour
18:15Free time & Transit to Gewölbegänge
19:00Evening event at Gewölbegänge

Program Tuesday, 12.09.2023

09:15Florian Preischel (Ruhr-Universität Bochum)
Processing of 2D silica via ALD for selective gas separation membranes
09:40Mario Ziegler (Leibniz Institute of Photonic Technology Jena)
Ultra-thin NbN films by PE-ALD for second generation quantum devices
09:55Florian Eweiner (Heraeus)
Facilitating precious metal deposition: The role of Heraeus in the Ruthenium value chain
10:10Robert Zierold (Universität Hamburg)
(PE)ALD of insulating and superconducting materials as a prerequisite for thin-film-based SRF cavities
10:25Oliver Briel (Dockweiler Chemicals)
Dock Chemicals – update on product pipeline and strategic perspective
10:45Coffee break & Poster session
11:05Martin Knaut (TU Dresden)
ALD film growth and sticking coefficients
11:20Ralf Tonner-Zech (Universität Leipzig)
Density functional theory helps reveal area-selective deposition on metal/semiconductor substrate patterns
11:35Xiao Hu (TU Chemnitz)
Atomistic Simulation of Copper Atomic Layer Etching
11:50Coffee break & Poster session
12:10Nils Boysen (Fraunhofer IMS)
Recent Developments in Processing 2D Materials and Metals via ALD for Functional Applications
12:25Daniel Schlamm (SEMPA)
Advanced Gas- and Chemical Supply Systems 
12:40Ivo Utke (Empa)
In-situ Raman investigations of TiO2 ALD on carbon nanotubes
12:55Student award
13:00Closing & Departure

Poster presentations

  • Franziska Beyer (Fraunhofer IISB/ Fraunhofer THM) – Morphological and electrical characterization of AlGaN/GaN heterostructures modified by atomic layer etching
  • Madeleine Bischoff (TU Chemnitz)Atomic layer deposition of titanium phosphate on carbon fibers using tris(trimethylsilyl) phosphate, titanium isopropoxide and water
  • Claudia Bock (Ruhr-Universität Bochum) – Low-temperature ALD and ALE processes for advanced integration of 2D materials in an industrial scale
  • Werner Goedel (TU Chemnitz)  – ALD coating onto bundles of technical fibres
  • Philipp Häussermann (TU Bergakademie Freiberg) – Bayesian optimization for thermal ALD-TiO2 carrier selective and passivating contacts
  • Niklas Huster (Ruhr-Universität Bochum) – Unearthing new precursors for Ru metal deposition: from developmental chemistry to applications
  • Camilla Minzoni (Empa) – Early-stage Growth Study of Cu Metal ALD Thin Films
  • Philip Klement (Universität Gießen) – Broadband Anti-Reflective Coatings on Plastic Optics Using Graded Refractive Index Alumina by Atomic Layer Deposition
  • Rahel-Manuela Neubieser (Fraunhofer IMS) – ALD Activities at Fraunhofer IMS: Tools, Materials and Applications
  • Jorit Obenlüneschloß (Ruhr-Universität Bochum) – Challenges in precursor chemistry for metal ALD: Alternative precursor systems and processes
  • Ingmar Ratschinski (TU Bergakademie Freiberg) – Modulation-Doped Silicon Nanowires via Aluminum-Induced Acceptor States in SiO2 using ALD-AlOx Monolayers
  • Ingmar Ratschinski (TU Bergakademie Freiberg) – Influence of Process Parameters on the Crystallinity of Ga2O3 produced by Atomic Layer Deposition (ALD)
  • Marcel Schmickler (Ruhr-Universität Bochum) – Understanding ligand diversity for rare earth based complexes: From precursors to materials
  • Dongho Shin (Leibniz-Institut für Festkörper- und Werkstoffforschung Dresden) – Stacking sulfide based 2D materials using ALD
  • Martin Wilken (Ruhr-Universität Bochum)  – Strategies to tune physico-chemical properties of precursors for transition metal chalcogenide thin film deposition
  • Jun Yang (Leibniz-Institut für Festkörper- und Werkstoffforschung Dresden) – ALD Sb2Te3 Films and Heterostructure : Thermoelectric and Optoelectronic Properties
  • Mathias Franz (Fraunhofer ENAS) – Development of a cobalt atomic layer deposition process using Co2(CO)6HC≡CC5H11 as precursor
  • Bodo Kalkofen (Max-Planck-Institut für Mikrostrukturphysik) – BRICKS – A Modular Precursor Supply System for ALD or CVD

Program download (PDF):

Information for authors (presentation and poster)

To ensure a smooth transit between presentations, we kindly ask all speakers to hand in their presentation until 07.09.2023.

To further enhance knowledge exchange and discussion in the ALPIN network, we kindly ask you to provide your slides or poster for sharing with all registered participants. The material will be made available on the ALPIN website in a password-protected area. This is voluntary.

Workshop venue

The workshop takes place at the Alte Aktienspinnerei – the University library of the Technical University of Chemnitz. It is located close to Chemnitz main station.

Address: Alte Aktienspinnerei, Straße der Nationen 33, 09111 Chemnitz
Coordinates: 50.84139, 12.92688


Evening event

The evening event will take place in the Chemnitzer Gewölbegänge. Build in the 16th century, the Gewölbegänge are originally created as large vaults to store beer. Nowadays they provide a unique evening location. We recommend closed footgear.

The Gewölbegänge are reachable by foot from the workshop venue in 20 minutes. A guided walk to the evening location starts at 18:30 at the main entrance of the Aktienspinnerei.

Address: Chemnitzer Gewölbegänge, Fabrikstraße 6, 09111 Chemnitz
Coordinates: 50.83371, 12.91451



The organizing team looks forward to welcoming you in Chemnitz. If you have any questions, do not hesitate to contact us at


Martin Knaut

Local organizing committee TU Chemnitz & Fraunhofer ENAS

Jörg Schuster

Linda Jäckel

Lysann Kaßner

Mathias Franz

Mareen Bunar

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