Atomic Layer Process Innovation Network
This year’s cfaed Summer School “Dresden Microelectronics Academy (DMA’24)” will by steered by Prof. Stefan Mannsfeld and supported by the Dresden companies Bosch, Globalfoundries, Infineon, and X-Fab. The one-week event will take place from 9-13 September 2024.
We present a model for surface coverage during ALD to include precursor desorption from the surface, which leads to incomplete conformality. The model combines existing Knudsen diffusion and Langmuir kinetics methods and includes the Bosanquet formula for gas-phase diffusivity and reaction reversibility.
Dear ALP-Community, This year’s ALPIN workshop will take place from 24.09. to 25.09.2024 in Jena, organized by Adriana Szeghalmi (Fraunhofer IOF) and Mario Ziegler (Leibniz IPHT). We are delighted to have the following companies as sponsors for this year’s workshop: Workshop program @ 24.09.2024 Time Presenter – Title 12:00 – 13:00 M. Z. – Arrival, registration, … Weiterlesen
NaMLab invites to the Novel High-k Application Workshop on March 11th and 12th, 2024. New challenges offered by the application of high-k dielectric materials in micro– and nanoelectronics are discussed by more than 100 participants from industry, research institutes and universities. Please find more information at the NaMLab website: https://www.namlab.com/high-k-workshop-2024-save-the-date-march-11-12th/
The 7th International Conference „ALD FOR INDUSTRY“ will again bridge the gap between fundamental science, industrialization and commercialization of this technology. This event is already establied since 2016 and attracts annually more than 100 participants and numerous exhibitors to visit Dresden. The Conference with Tutorial provides the opportunity to learn more about fundamentals of ALD technology, to get informed about recent progress in the field and to get in contact with industrial and academic partners.
Am 27./28.02.2024 kommen Vertreter der Mikroelektronikforschung deutscher Hochschulen und Industrie in Dresden zusammen, um gemeinsam Tendenzen, Chancen und Herausforderungen in der Nachwuchsförderung zu diskutieren.
This paper presents the development of an atomic layer deposition (ALD) process for metallic cobalt. The process operates at low temperatures using dicobalt hexacarbonyl-1-heptyne [Co2(CO)6HC≡CC5H11] and hydrogen plasma at temperatures between 50 and 110 °C. X-ray photoelectron spectroscopy measurements could show that the deposited cobalt is in the metallic state and the established process shows a homogeneous coating at the wafer level.
Please vote for the best student contribution and the best student paper of this year’s ALPIN workshop. Note: Try to be objective and fair and really choose the best presentation in your opinion (not the person). The prizes for the student awards 2023 are sponsored by ALS Metrology (https://als-metrology.de/) – your partner for in situ … Weiterlesen
This year’s program and final information for the ALPIN workshop 2023 in Chemnitz.
We are looking forward to contributions in the form of posters, plenary (approx. 20+5 min) or technical presentations (approx. 10+5 min) on ALD or ALE related topics.
Please register at the website and provide us with your presentation title and the type of presentation you prefer.