Welcome to the ALP workshop at FTME 2025, where we dive into cutting-edge Atomic Layer Processing techniques that are enabling modern microelectronics manufacturing. This workshop will take place on Tuesday, February 11, 2025, as part of the ForLab Microelectronics Symposium at TU Ilmenau.
Workshop agenda:
09:00 Welcome (Martin Knaut, TU Dresden)
09:05 The current status of ALP research in Japan (Yukihiro Shimogaki (UTokyo)
09:25 Atomic layer etching of SiO2 using sequential SF6 gas and AR plasma (Robert Zierold, Universität Hamburg)
09:45 Facing the key challenges in atomic layer processing for future 2D electronics (Claudia Bock, RU Bochum)
10:05 Atomic layer deposition of cobalt for interconnect applications (Jun Yamaguchi (UTokyo)
10:25 Break
10:35 From research to manufacturing: Challenges of transferring deposition processes to industry partners in the semiconductor industry (Thomas Werner, Chipmetrics)
10:55 VolaChem – Chemical volatiles for technical purposes: Precursors for ALD (Martin Wilken, VolaChem)
11:15 Flash-Lamp Annealing Enabled Atomic Layer Deposition (Yuanhe Cui, TU Dresden)
11:35 HfS2 thin films grown by a novel atomic layer deposition process utilizing TDMAHf precursor (Anna Linkenheil, TU Ilmenau)
11:55 Wrap up (Martin Knaut, TU Dresden)